Mask Pattern for Combinatorial Film

Mask pattern can be used in Sputter, Electron beam evaporator and PLD.
This device allow you to make Combinatorial film, applied in nano-structured and  molecular layer composition on a single substrate.
Operated by software and XYZ stage. Automatically control scanning Speed and mask move distance.
One sample with different working parameters (Temperature, Pressure, Thin film thickness, Power level,  working distance etc....
It can be installed in fixed pattern and transfer from Load Lock Chamber.

Qubit multi-chamber systems  JEB-Diamond

Quantum computing E-beam Evaporator
Adnano-tek All JEB-X system are UHV E-beam evaporator or UHV Sputter_evaporator, we support qubit devices research groups, A series of systems specifically designed for Josephson Junctions deposition. Multi-chamber systems, User can choice 2 chambers, 3 chambers, 4 chambers or 6 chambers. Module design give scientist unlimited experience.
​http://www.baqis.ac.cn/


Indium Bump Evaporator
Indium bump is important for Qubit Application.
Substract is Al or TiN thin film (Made by Adnano-tek Sputter 24 or JEB-system)
To grow Indium bump is easy,  you need to control growth rate very high in evaporator temperature, it generated huge heat and make bump in a bad shape. We use easy way to control sample temperature with high growth rate.
On the other hand, our equipment is protect chamber from Indium deposition, deposition chamber no need high frequency service; it just easy remove waste film on shields.

The Evaporator is Fully automatic by software and able to use metal mask or standard Metal lift off process.
It has optional package for choice automatic filling Indium in vacuum.
​

Indium evaporated result

Pulsed Laser Deposition Systems 


PLD-18L is Flagship PLD of Adnano-tek, It is possible to integrated with Sputter gun, Effusion cell, High pressure RHEED, Laser pulse  Control and it can place 8 X 1 inch target or 4 X 2 inch target all of them can be replace under vacuum through load lock chamber. Use our high speed laser scanner we can easy make large scale result.
​http://ivry.net.technion.ac.il/

UHV Magnetron Sputter (Sputter 24 and Twin 24)


UHV Sputter-24 designed for MTJ and TMR Sputter
It is a smart, robust, and versatile design in sputtering deposition. The confocal design with improved system base pressures and pump down times. A reasonable chamber design, LabView best software control system with advanced programming capability, Manual or automatic substrate loading. Monolayers, Multilayers, Magnetic films,Optic films, Reactive sputtering.

High Pressure RHEED is possible to used in Adnano-tek UHV Sputter system.
Sputter RHEED for magnetron sputter deposition.
http://https://facultyold.ecnu.edu.cn/s/3734/main.jspyw

 E-Beam Evaporator 

Adnano-tek EBS-150 system is Standard E beam evaporator, it provides the ultimate in flexibility, offer a range of deposition functions, include e-beam evapotation, resistance evaporation, sputter and ion beam assisted deposition.
The Base pressure is 5E-7 torr or better, Designed as standard alone system, Very suitable for Metal Lift-off process,Magnet material, MEMS, Thermo barriers and Josephson circuits etc application.

Moleculare Beam Epitaxy

Adnano-tek MBE-10 system has been developed for the growth of high quality III-V and Topological insulator on 4 inch substrates. The system can be upgraded to 6 inch substrate size. The MBE chamber is equipped with up to 10 effusion cells or gas injectors for deposition.
​https://researchoutput.ncku.edu.tw/zh/persons/jung-chun-huang

ALD link XPS system (ALD/CVD) with ion source

Atomic Layer Deposition System

Adnano-tek provide combination systems like this or completely integrated custom systems specific to your requirements.

For example our ADLconnect to Phi XPS load lock, Finish processed substract transfered to XPS for measurement.
Our ALD option high energy ion source for etching and excitation source for quadruple analysis.

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