Quantum computingE-beam Evaporator Adnano-tek All JEB-X system are UHV E-beam evaporator or UHV Sputter_evaporator, we support qubitdevices research groups, A series of systems specifically designed for Josephson Junctions deposition. Multi-chamber systems, User can choice 2 chambers, 3 chambers, 4 chambers or 6 chambers. Module design give scientist unlimited experience.
PLD-18L is Flagship PLD of Adnano-tek, It is possible to integrated with Sputter gun, Effusion cell, High pressure RHEED, Laser pulse Control and it can place 8 X 1 inch target or 4 X 2 inch target all of them can be replace under vacuum through load lock chamber. Use our high speed laser scanner we can easy make large scale result.
UHV Sputter-24 is a smart, robust, and versatile design. The confocal design with improved system base pressures and pump down times. A reasonable chamber design, LabView best software control system with advanced programming capability, Manual or automatic substrate loading. Monolayers, Multilayers, Magnetic films,Optic films, Reactive sputtering.
Adnano-tek EBS-150 system is Standard E beam evaporator, it provides the ultimate in flexibility, offer a range of deposition functions, include e-beam evapotation, resistance evaporation, sputter and ion beam assisted deposition. The Base pressure is 5E-7 torr or better, Designed as standard alone system, Very suitable for Metal Lift-off process,Magnet material, MEMS, Thermo barriers and Josephson circuits etc application.
Adnano-tek MBE-10 system has been developed for the growth of high quality III-V and Topological insulator on 4 inch substrates. The system can be upgraded to 6 inch substrate size. The MBE chamber is equipped with up to 10 effusion cells or gas injectors for deposition.