AdNaNo-tek is developing UHV deposition Equipment on E-beam evaporator, Sputter, PLD(Laser MBE), and MBE system.
For Start-up Lab or university, Adnano-tek is your thin film deposition system partner. We provide Ultra High Vacuum components and reliable deposition system
JEB Diamond
This is a multi Chambers Equipment, Fully automatic and UHV compatible.
It include E beam evaporator, Sputter, ion milling, Oxidation and Special heating chamber.

UHV Sputter (Left), UHV E-beam Evaporator (Middle), and PLD system (right).

Pulsed Laser Deposition Systems (PLD-18L)

PLD-18L

PLD-18L is Flagship PLD of Adnano-tek, It is possible to integrated with Sputter gun, Effusion cell, High pressure RHEED, Laser pulse  Control and it can place 8 X 1 inch target or 4 X 2 inch target all of them can be replace under vacuum through load lock chamber. Use our high speed laser scanner we can easy make large scale result.

Pulsed Laser Deposition Systems (PLD-12L)

PLD-12L
 is our most advanced PLD,  It is very compact, so pumping speed is very fast, possible to integrated with Sputter gun, Effusion cell, High pressure RHEED, Laser Pulse  Control and it can place 6 X 1 inch target, Exchange through Load Lock Chamber without break main chamber vacuum.
Very compact chamber design, fast pumping speed.

UHV Magnetron Sputter (Sputter 24)

UHV Sputter-24 is a smart, robust, and versatile design. The confocal design with improved system base pressures and pump down times. A reasonable chamber design, LabView best software control system with advanced programming capability, Manual or automatic substrate loading. Monolayers, Multilayers, Magnetic films,Optic films, Reactive sputtering.

Qubit multi-chamber systems  JEB-4

Quantum computing E-beam Evaporator
Adnano-tek All JEB-X system are UHV E-beam evaporator or UHV Sputter_evaporator, we support qubit devices research groups, A series of systems specifically designed for Josephson Junctions deposition. Multi-chamber systems, User can choice 2 chambers, 3 chambers, 4 chambers or 6 chambers. Module design give scientist unlimited experience.

 E-Beam Evaporation  and  Fully automatic E-Beam JEB4

Adnano-tek EBS-150 system is Standard E beam evaporator, it provides the ultimate in flexibility, offer a range of deposition functions, include e-beam evapotation, resistance evaporation, sputter and ion beam assisted deposition.
The Base pressure is 5E-7 torr or better, Designed as standard alone system, Very suitable for Metal Lift-off process,Magnet material, MEMS, Thermo barriers and Josephson circuits etc application.

Moleculare Beam Epitaxy

Adnano-tek MBE-10 system has been developed for the growth of high quality III-V and Topological insulator on 4 inch substrates. The system can be upgraded to 6 inch substrate size. The MBE chamber is equipped with up to 10 effusion cells or gas injectors for deposition.

Thermo ALD link XPS system (ALD/CVD)

Atomic Layer Deposition System

Adnano-tek can provide combination systems like this or completely integrated custom systems specific to your requirements.connected via a dual wafer load lock.

​Sample Trasnferring Video

​Scientific Journals Generated from AdNaNoTek UHV System
ACS Nano (2016) 10, 4403

Stretchable Spin Valve with Stable Magnetic Field Sensitivity by Ribbon-Patterned Periodic Wrinkles by Huihui Li, Run-Wei Li, et al.

See More
Useful Links
http://ivry.net.technion.ac.il/
http://www.mse.nctu.edu.tw/teacher/ins.php?index_id=41
http://hbwang.nju.edu.cn/
https://nckujcalab.wixsite.com/jcalab
http://nanosciencelab.blogspot.com/
​http://lqcc.ustc.edu.cn/index/info/525

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