AdNaNo-tek is developing UHV deposition Equipment on E-beam evaporator, Sputter, PLD(Laser MBE), and MBE system.
For Start-up Lab or university, Adnano-tek is your thin film deposition system partner. We provide Ultra High Vacuum components and reliable deposition system

UHV Sputter (Left), UHV E-beam Evaporator (Middle), and PLD system (right).

Pulsed Laser Deposition Systems (PLD-18L)

PLD-18L

PLD-18L is Flagship PLD of Adnano-tek, It is possible to integrated with Sputter gun, Effusion cell, High pressure RHEED, Laser Beam Control and it can place 8 X 1 inch target or 4 X 2 inch target all of them can be replace under vacuum through load lock chamber. Use our high speed laser scanner we can easy make large scale result.

PLD-12L

Pulsed Laser Deposition (PLD) Systems use a laser beam (or high energy beam like electron beam) to vaporize target material in order to produce a thin film with exactly the same chemical composition as the original target material. The PLD process Almost all material or compound materials.

PLD-12L is our most advanced PLD,  It is possible to integrated with Sputter gun, Effusion cell, High pressure RHEED, Laser Beam Control and it can place 6 X 1 inch target through Load Lock Chamber.
Very compact chamber design, fast pumping speed.

UHV Magnetron Sputter (Sputter 24)

UHV Sputter-24 is a smart, robust, and versatile design. The confocal design with improved system base pressures and pump down times. A reasonable chamber design, LabView best software control system with advanced programming capability, Manual or automatic substrate loading. Monolayers, Multilayers, Magnetic films,Optic films, Reactive sputtering.

Qubit multi-chamber systems  JEB-4

Quantum computing E-beam Evaporator
Adnano-tek All JEB-X system are UHV E-beam evaporator or UHV Sputter_evaporator, we support qubit devices research groups, A series of systems specifically designed for Josephson Junctions deposition. Multi-chamber systems, User can choice 2 chambers, 3 chambers, 4 chambers or 6 chambers. Module design give scientist unlimited experience.

 E-Beam Evaporation (EBS-150)

Adnano-tek EBS-150 system is Standard E beam evaporator, it provides the ultimate in flexibility, offer a range of deposition functions, include e-beam evapotation, resistance evaporation, sputter and ion beam assisted deposition.
The Base pressure is 5E-7 torr or better, Designed as standard alone system, Very suitable for Metal Lift-off process,Magnet material, MEMS, Thermo barriers and Josephson circuits etc application.

Moleculare Beam Epitaxy

Adnano-tek MBE-10 system has been developed for the growth of high quality III-V and Topological insulator on 4 inch substrates. The system can be upgraded to 6 inch substrate size. The MBE chamber is equipped with up to 10 effusion cells or gas injectors for deposition.

Thermo ALD link XPS system (ALD/CVD)

Atomic Layer Deposition System

Adnano-tek can provide combination systems like this or completely integrated custom systems specific to your requirements.connected via a dual wafer load lock.

​Sample Trasnferring Video

​Scientific Journals Generated from AdNaNoTek UHV System
ACS Nano (2016) 10, 4403

Stretchable Spin Valve with Stable Magnetic Field Sensitivity by Ribbon-Patterned Periodic Wrinkles by Huihui Li, Run-Wei Li, et al.

See More
Useful Links
http://ivry.net.technion.ac.il/
http://www.mse.nctu.edu.tw/teacher/ins.php?index_id=41
http://hbwang.nju.edu.cn/
https://nckujcalab.wixsite.com/jcalab
http://nanosciencelab.blogspot.com/
​http://lqcc.ustc.edu.cn/index/info/525

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