E-Beam Evaporator
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E-beam evaporator is a versatile multisource deposition tool which allows deposition a wide range of materials like
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Molecular Beam Epitaxy
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Adnano-tek's MBE systems are easy to use with a design configurable for III-V and emerging materials, including applications that require the integration with e-beam technology. Modular design allows combining different deposition techniques with surface analysis without exposure samples to the atmospheric air.
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Magnetron Sputtering Systems
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Adnano-tek provides a family of stand-alone or integrated Magnetron Sputtering Systems. Depending on customer application DC or RF magnetron sources could be installed with substrate holder up to 8 in. Substrate temperature could be achieved up to 800 C with resistance heater. Laser substrate heater is available as an option.
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Pulsed Laser Deposition
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Pulsed Laser Deposition is another versatile widespread technique which is used for preparation of metal oxides and other materials. High power short wavelength laser source is used for sublimation of target materials which adsorbs on the substrate surface. Adnanotek provides PLD tools with different number of targets and additional deposition equipment depending on customer needs.
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Direct Laser Writer
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Adnanotek's Direct Laser Writer is best fit for rapid and low cost production of photo masks or direct formation of the photo resist pattern on the wafer. Short wavelength diode laser source (405 nm) and sophisticated optical design allow photo-resist pattern fabrication with spatial resolution better than 5 μm. Dedicated software supplied with DLW would help to make mask fabrication process fast and effective.
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