Sputter system | e beam evaporator | PLD | Pulsed laser deposition
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E-beam evaporation, can call one of thermal evaporation process, uses an electron beam of several kilo Voltage energy onto the source material and melting this material to be vaporized, and then deposited on a substrate to form a thin film. E-beam evaporation has a better deposition rate than sputtering.

Advantage:

Excellent uniformity
Almost all the material
Material impurity is very low
Deposition rate is high
Good directionality

Possible work with ion source



Dual E-Beam Titanium Thin-Film Data Analysis

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Achievement

AdNanoTek's Dual E-beam Evaporator fabricated 4-inch Ti thin-film with high degree of homogeneity, and uniformity of ±1.7%.
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Related Links:
Technology: E-Beam Evaporator
Product: E-BEAM
Experimental Research
Sputter technology is a plasma-based coating method where positively charged energetic ions bombard a negatively biased target material, the target atoms from the target that are then deposited onto a substrate. This process occurs in a closed magnetic field to trap electrons and boost efficiency. This method produces good film quality and the highest scalability of any PVD type. It produce several meters size coating.

Advantage:

Excellent uniformity
All the material no matter metal or non conductive material
Material impurity is very low
Deposition rate is low

Possible in small to very large area deposition
Picture

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Ultrahigh Vacuum (UHV) Systems
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  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated >
        • Scientific Papers PLD
        • Scientific Papers MSD
        • Scientific Papers MBE
      • Certifications ISO 9001
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Media
  • Contact