Sputter system | e beam evaporator | PLD | Pulsed laser deposition
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What is E-beam Evaporator technology?
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UHV Electron Beam Evaporator (EBE)

Introductory Principle

In Electron Beam Evaporator (EBE), high-energy electron beam is generated from tungsten filament, while electric and magnetic field direct these electrons towards the target material to heat up the surface of the target. Electron beam position can be confirmed visually to ensure that the electrons bombard the target in the correct location. Upon heating up the target, the vapor pressure of the target increases hence evaporating the surface atoms. The vapor will then travel and condense on the substrate forming thin-layer film.

AdNanoTek's E-beam system is equipped with substrate planetary manipulator which revolve and rotates multiple sample.
This allows precise and simultaneous deposition of thin film in multiple substrates, while significantly improving the uniformity and quality of the deposited thin-film due to the revolution and rotation motion.  AdNanoTek's FBBear system control software can allow fine tuning, recording and automatically setting of the parameters to be used in the deposition process. This makes the deposition process fully automated, user-friendly and consistent.
Picture
Electron-beam evaporation: using magnetic fields to precisely control the direction of the electron beam to heat target on a specific location
图片
Electron gun

Systems Overview

E-beam Evaporator
图片
UHV Deposition Techniques
Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems
Integrated UHV Systems
Customized UHV Systems

UHV Technologies
Thin-film Deposition
Surface Science
Laser Heating Systems

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  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated >
        • Scientific Papers PLD
        • Scientific Papers MSD
        • Scientific Papers MBE
      • Certifications ISO 9001
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Media
  • Contact