Ion Beam Deposition System

AdNaNoTek’s Ion Beam Sputtering Deposition (IBSD) can deposit large-scale thin-film with extremely high quality and a great repeatability. IBSD utilizes ion source to generate a focused ion beam directed at the target to be sputtered. Since the target material is ablated by momentum transfer rather than a chemical or thermal process, any material can be deposited on the substrate (whether it is conductor, or insulator). Target holders are designed to have multiple faces that allows deposition of different targets by means of rotation. In addition, ion beam assisted sputtering source is included that allows gradual transition between the substrate material and the deposited film, by reducing crystal strain. And, together with the mask system, this will allow formation of unique deposition pattern on the thin film.
MAIN SPECIFICATIONS:

  • Custom-type SS316L electro-polished chamber
  • 5E-7 Torr Base Pressure
  • Vacuum pumps and gauges
  • 4-in substrate
  • 4-axes sample manipulator (XYZ, and Rotation)
  • Water cooling manipulator
  • Ion Beam Deposition and assist Source (Gridded - RFICP / KDC; or Gridless - EH)
  • 4 Sputter cathodes
  • Cube-type target assembly
  • ​Thickness monitor
  • FBBeam System Control Software
In addition, precise control and high stability is achieved by making the process automated with the use of the FBBEAR control software. The FBBEAR control software, provides complete data logging, precise parameter tuning  which allows user to have easy operation and reliable experimental repeatability.

IBSD can be applied for thin layer deposition of materials like: Spin valves/AMR/GMR materials, magnetic tunnel junctions, dielectric interference coatings, high-k materials, shape memory alloys, superconducting materials, etc.

Ion Beam Etching (IBE)

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Ion Beam Sputtering Deposition System (IBSD-20)
This is very special equipment included Magnetron Sputter Deposition, IBSD and Ion Beam Etching together

MAIN SPECIFICATIONS:

  • Custom-type SS304 electro-polished chamber
  • 5E-7 Torr Base Pressure
  • Vacuum pumps and gauges
  • 4-in substrate
  • 4-axes sample manipulator (XYZ, and Rotation)
  • Water cooling manipulator
  • Ion Beam Deposition and assist Source (Gridded - RFICP / KDC; or Gridless - EH)
  • 4 Sputter cathodes
  • Cube-type target assembly
  • ​​Thickness monitor
  • FBBeam System Control Software

Advantages of Ion-Beam Sputtering Deposition

  • High quality film
  • Low background pressure
  • Control of beam energy, current, species, and incident angle
  • All parameters can be control almost independently in a wide range
  • Congruent evaporation
  • Versatile method (any material)

System Control Software

FBBEAR software is a multi-functional software to control the whole IBSD - 20 system, i.e. Manipulator rotation speed, heating program, target revolution, etc.

FBBEAR can control EUROTHERMO2408 to control, tune and save multi-PID parameters for laser/filament heater for the best accuracy of different substrate temperature requirements.

FBBEAR’s Deposition wizard make it hassle free to set, customize and save your experimental recipe and fully automatize the deposition processes. This also allows easy repetition of the deposition process having same experimental parameters. In addition, it also allows recording of data log in order to review past deposition parameters.

FBBear can do data processing and analysis.

Optional

  • O2 or N2 plasma source
  • Ion beam assisted deposition system
  • Pre-annealing heating system in Load Lock
  • Chamber designs are customizable
  • Sputter Cathodes

Related Link:

Technologies: IBSD

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