AdNaNoTek’s Ion Beam Sputtering Deposition (IBSD) can deposit large-scale thin-film with extremely high quality and a great repeatability. IBSD utilizes ion source to generate a focused ion beam directed at the target to be sputtered. Since the target material is ablated by momentum transfer rather than a chemical or thermal process, any material can be deposited on the substrate (whether it is conductor, or insulator). Target holders are designed to have multiple faces that allows deposition of different targets by means of rotation. In addition, ion beam assisted sputtering source is included that allows gradual transition between the substrate material and the deposited film, by reducing crystal strain. And, together with the mask system, this will allow formation of unique deposition pattern on the thin film.
MAIN SPECIFICATIONS:
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MAIN SPECIFICATIONS:
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FBBEAR software is a multi-functional software to control the whole IBSD - 20 system, i.e. Manipulator rotation speed, heating program, target revolution, etc.
FBBEAR can control EUROTHERMO2408 to control, tune and save multi-PID parameters for laser/filament heater for the best accuracy of different substrate temperature requirements. FBBEAR’s Deposition wizard make it hassle free to set, customize and save your experimental recipe and fully automatize the deposition processes. This also allows easy repetition of the deposition process having same experimental parameters. In addition, it also allows recording of data log in order to review past deposition parameters. FBBear can do data processing and analysis. |
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Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems Integrated UHV Systems Customized UHV Systems |
UHV Technologies
Thin-film Deposition Surface Science Laser Heating Systems |