Sputter system | e beam evaporator | PLD | Pulsed laser deposition

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MBE | metal mbe, III-V MBE| II-VI mbe
Molecular Beam Epitaxy (MBE)
PLD, pulsed laser de position and Laser mbe PLD with high pressure RHEED
Pulsed Laser Deposition (PLD) (Laser MBE)
UHV sputter, high vacuum sputter, plasma sputter cathode planery cathode sputter gun
Magnetron Sputtering Deposition (Sputter)
uhv electron beam evaporator uhv sputter and e beam integrated system
Electron Beam Evaporator (EBE)
ion beam etching ion beam assisted deposition ibad ion beam sputtering deposition chemical ion beam process etching
Ion Beam Sputter Deposition (IBSD)
atomic layer deposition ald thermo ald and plasma enhanced ald
Plasma Enhanced Atomic Layer Deposition (PEALD)
multi function coat and etching and analysis system
Cluster Systems
survivor in oxygen heater, over 1200 degree C laser heating
Laser Heating Manipulator (LHM)
UHV chamber gate valve angle valve
UHV Components

Mask Pattern for Combinatorial Film

Mask pattern can be used in Sputter, Electron beam evaporator and PLD.
This device allow you to make Combinatorial film, applied in nano-structured and  molecular layer composition on a single substrate.
Operated by software and XYZ stage. Automatically control scanning Speed and mask move distance.
One sample with different working parameters (Temperature, Pressure, Thin film thickness, Power level,  working distance etc....
It can be installed in fixed pattern and transfer from Load Lock Chamber.

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Qubit deposition systems  JEB-Diamond

Quantum computing E-beam Evaporator
Adnano-tek All JEB system are UHV E-beam evaporator or UHV Sputter_evaporator, we support qubit devices research groups, A series of systems specifically designed for Josephson Junctions deposition. Multi-chamber systems, User can choice 2 chambers, 3 chambers, 4 chambers or 6 chambers. Module design give scientist unlimited experience.
2105.09890.pdf
File Size: 929 kb
File Type: pdf
Download File

​http://www.baqis.ac.cn/
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Indium Bump Evaporator
Indium bump is important for Qubit Application.
Substract is Al or TiN thin film (Made by Adnano-tek Sputter 24 or JEB-system)
To grow Indium bump is easy,  you need to control growth rate very high in evaporator temperature, it generated huge heat and make bump in a bad shape. We use easy way to control sample temperature with high growth rate.
On the other hand, our equipment is protect chamber from Indium deposition, deposition chamber no need high frequency service; it just easy remove waste film on shields.

The Evaporator is Fully automatic by software and able to use metal mask or standard Metal lift off process.
It has optional package for choice automatic filling Indium in vacuum.
​

Indium evaporated result


Pulsed Laser Deposition Systems 


PLD-18L is Flagship PLD of Adnano-tek, It is possible to integrated with Sputter gun, Effusion cell, High pressure RHEED, Laser pulse  Control and it can place 8 X 1 inch target or 4 X 2 inch target all of them can be replace under vacuum through load lock chamber. Use our high speed laser scanner we can easy make large scale result.
​http://ivry.net.technion.ac.il/
Find More PLD

UHV Magnetron Sputter (Sputter 24 and Twin 24)


UHV
Sputter-24 designed for MTJ and TMR Sputter
It is a smart, robust, and versatile design in sputtering deposition. The confocal design with improved system base pressures and pump down times. A reasonable chamber design, LabView best software control system with advanced programming capability, Manual or automatic substrate loading. Monolayers,
Multilayers, Magnetic films,Optic films, Reactive sputtering.

High Pressure RHEED is possible to used in Adnano-tek UHV Sputter system.
Sputter RHEED for magnetron sputter deposition.
http://https://facultyold.ecnu.edu.cn/s/3734/main.jspyw
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 E-Beam Evaporator 

Adnano-tek EBS-150 system is Standard E beam evaporator, it provides the ultimate in flexibility, offer a range of deposition functions, include e-beam evapotation, resistance evaporation, sputter and ion beam assisted deposition.
The Base pressure is 5E-7 torr or better, Designed as standard alone system, Very suitable for Metal Lift-off process,Magnet material, MEMS, Thermo barriers and Josephson circuits etc application.
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Moleculare Beam Epitaxy

Adnano-tek MBE-10 system has been developed for the growth of high quality III-V and Topological insulator on 4 inch substrates. The system can be upgraded to 6 inch substrate size. The MBE chamber is equipped with up to 10 effusion cells or gas injectors for deposition.
​https://researchoutput.ncku.edu.tw/zh/persons/jung-chun-huang
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ALD link XPS system (ALD/CVD) with ion source

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Atomic Layer Deposition System

Adnano-tek provide combination systems like this or completely integrated custom systems specific to your requirements.

For example our ADLconnect to Phi XPS load lock, Finish processed substract transfered to XPS for measurement.
Our ALD option high energy ion source for etching and excitation source for quadruple analysis.



Find More ALD


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​Scientific Journals Generated from AdNaNoTek UHV System
Picture
ACS Nano (2016) 10, 4403

Stretchable Spin Valve with Stable Magnetic Field Sensitivity by Ribbon-Patterned Periodic Wrinkles by Huihui Li, Run-Wei Li, et al.

See More


Useful Links
http://ivry.net.technion.ac.il/
http://https://facultyold.ecnu.edu.cn/s/3734/main.jspywww.mse.nctu.edu.tw/teacher/ins.php?index_id=41
http://hbwang.nju.edu.cn/
https://nckujcalab.wixsite.com/jcalab

http://nanosciencelab.blogspot.com/
​http://lqcc.ustc.edu.cn/index/info/525
http://www.researcherid.com/rid/D-1742-2012
​
https://phyai.fudan.edu.cn/main.htm
​​https://memdlen.nimte.ac.cn/
http://spst.shanghaitech.edu.cn/2018/1029/c2355a38838/page.htm

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  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Deposition systems_N
    • EBV_N
    • MBE_N
    • Magnetron Sputtering_N
    • PLD_N
    • Ion Beam Sputter Deposition_N
  • Direct Laser Writer_N
  • Media
  • Contact