Industrial In Line Sputter
Substrate size up to 400X400mm
Base pressure better than 5E-7 torr
Two load lock and two process chamber with up to 4 rotary cathode; used for ITO/Ag/ITO, and Al/Mo/Al, Cu deposition.

Scientific Journals Generated from AdNaNoTek UHV System
ACS Nano (2016) 10, 4403

Stretchable Spin Valve with Stable Magnetic Field Sensitivity by Ribbon-Patterned Periodic Wrinkles by Huihui Li, Run-Wei Li, et al.

See More
AdNaNoTek's Worldwide Presence
Global Representative

AdNaNoTek cooperate with UHV professionals and experts worldwide to provide excellent UHV Deposition systems around the world.

See More

Check out AdNaNoTek's Brochures, History, and News
to know more about us, our products, and technologies

Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems
Integrated UHV Systems
Customized UHV Systems
UHV Technologies
Thin-film Deposition
Surface Science
Laser Heating Systems
Legal Notice   |   Privacy Policy   |   Site Map
© Copyright 2014 AdNaNoTek Corporation. All rights reserved.