Ion Beam Sputter Deposition
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Adnanotek’s Ion Beam Sputtering Deposition (IBSD) systems providing deposition of large-scale thin-films with extremely high quality and great repeatability. IBSD utilizes ion source to generate a focused ion beam directed at the target to be sputtered. Since the target material is ablated by momentum transfer rather than a chemical or thermal process, a wide range of materials can be deposited on the substrate (whether it is conductor or insulator). Target holders are designed to have multiple faces providing deposition of different targets by means of rotation. The formation of unique custom designed pattern could be further realized by adding the mask option.
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