Sputter system | e beam evaporator | PLD | Pulsed laser deposition
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IP - 4000: IBSD - PLD

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AdNaNoTek's IP - 4000 is an linear integration system that includes PLD and IBSD deposition systems.
Researchers can operate the systems individually or combine series of deposition process through the UHV linear transfer system.
All systems are UHV compatible (5E-10torr) and the tunnel system can be extended indefinitely.


Integrated Components

Pulsed-Laser Deposition (PLD - 12)

MAIN SPECIFICATIONS:
  • 12-in spherical chamber with mirror polish
  • Base pressure 5E-10torr
  • 4-axis (XYZR) manipulator with laser heater
  • Heating temperature above 1100°C
  • Planetary target manipulator with 6 1-in target holder (size depends on request)
  • Mask with control software
  • Pressure control system
  • 1200 Pfeiffer turbo pump
  • Full range vacuum gauge
  • Industrial computer with 23" touchscreen monitor
  • System software Control
  • Laser optical path
  • Excimer laser (sold separately)
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UHV Ion-Beam Deposition (IBSD - 20)

MAIN SPECIFICATIONS:
  • Base pressure 5E-10torr
  • 4-axis (XYZR) manipulator with SiC heater
  • Heating temperature up to 900°C
  • KRI ion beam deposition source
  • 4 sputter cathodes available
  • Dual mask system with control software
  • Thickness monitor
  • Ion beam assisted source (optional)
  • Pressure control system
  • 700l/s Pfeiffer turbo pump
  • 6900l/s cryo pump
  • Full range vacuum gauge
  • Industrial computer with 23" touchscreen monitor
  • System control software
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Optional

  • Pre-heating (degassing) system
  • Automatic transferring system
  • ARPES analyzer system
  • SEM system
  • STM system
  • MBE system

Integrated UHV Systems
Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems
Integrated UHV Systems
Customized UHV Systems

UHV Technologies
Thin-film Deposition
Surface Science
Laser Heating Systems

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  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Deposition systems_N
    • EBV_N
    • MBE_N
    • Magnetron Sputtering_N
    • PLD_N
    • Ion Beam Sputter Deposition_N
  • Direct Laser Writer_N
  • Media
  • Contact