AdNaNoTek Laser Heating System

5-Axes UHV Laser Heating Manipulator

MAIN SPECIFICATIONS:

Laser power: 120W-2000W
Substrate size: 10x10 mm2 (up to 1-in dia)
Heating temperature 1200°C (E-3 torr and below) or 1000°C (above 760torr) Fully compatible to oxygen-rich or any atmospheric condition
±1°C temperature stability
PID temperature control
XYZ axis movements
360° continuous rotation
5° substrate tilt
Fan and Water cooling system
Pneumatic substrate shutter
Real-time temperature monitor by pyrometer (single wavelength, can monitor > 260°C)
State-of-the-art and easy operation computer software control
For high temperature applications
For Oxide-, or any atmospheric condition applications
Compatible with all UHV systems
Customizable

Compatibility to Oxygen-rich or any Atmospheric Conditions

Designing a high temperature heater for UHV thin-film deposition systems which can work in oxygen-rich or any atmospheric conditions is not easy. Conventional heating materials and mechanisms generate additional vapor pressure from its heating component materials which limits the achievable UHV condition, and oxidize its heating components which consequently deteriorate the heating material and process quality. There are some techniques to overcome this problem, such as Platinum heating element, SiC heating element with well-designed shape, etc. However, each methods has their own issues, such as high maintenance frequency, short life time due to oxidation of heating components, etc.

AdNaNoTek's Laser heating manipulator is developed as a perfect solution for heating your sample for UHV thin-layer deposition in oxygen-rich and any atmospheric conditions. It does not possess the disadvantages that other heaters have. In addition, it is easy-to-use, compact, customizable, and has fast and localized heating mechanism. It is equipped with a pyrometer to monitor the temperature, and has a system control software to automatically control the laser heating parameters and processes. AdNaNoTek's Laser Heating Manipulator is very suitable for laser oxide/nitride epitaxial techniques.

Localized Heating Area

AdNaNoTek’s Laser Heating Manipulaotr can heat the substrate with well focus beam, such that, only the targeted area will be heated. The heating mechanism is confined in a very small area of the plate, while the surrounding area stay at a relatively low temperature, hence, reducing the outgassing from nearby surfaces. Can heat substrates effectively up to 1-inch diameter.

In addition, the system's support tube remains cool even after 10 hours of operation. No overheating of laser system upon using for long period of time.

Laser Controller combines number of leading technologies such as...

Laser heater module with power supply (standard 200W)
Optical fiber
Focusing lens with adjustable support
Infrared pyrometer for temperature monitoring (with adjustable support)
PID temperature control
RS232 communication port for remote controlling
Control software for real time temperature monitoring, controlling, and alarm

Advantages

Heating temperature 1200°C (E-3 torr and below) or 1000°C (above E-3 torr) Fully compatible to oxygen-rich or any atmospheric condition
No heating components adds in vapor pressure in the chamber
Localized heated area, lesser out-gassing during heating (you can deposit with a cleaner condition)
Can process with rapid temperature ramping
Easier maintenance compare to traditional substrate heater (the heating element is outside of the vacuum)
Direct temperature measurement from sample/substrate by pyrometer

AdNaNoTek UHV Laser Heating Manipulator

2inch Laser Heater

Optional