Heater element broken when heat up subtracts under Oxygen or Ozone condition?
Use Adnano-tek Laser heater for PLD and Oxide MBE.
Triditional heater cannot survivir in oxygen condition because the heater element is very active in high temperature, it is easy to be broken during usage.
We used different way, Adnano-tek provide you ultimate solution. Based on our technology there is no heater element inside chamber; so there is no easy damage parts in the chamber. The laser device is inside controller with cooling device
Very Long life and high heating performance, and Only subtracts are in hot zone rest part of chamber rather cool.
10X10mm sample laser Heater
4 inch diameter sample Laser heater
5-Axes UHV Laser Heating Manipulator
Compatibility to Oxygen-rich or any Atmospheric Conditions
Designing a high temperature heater for UHV thin-film deposition systems which can work in oxygen-rich or any atmospheric conditions is not easy. Conventional heating materials and mechanisms generate additional vapor pressure from its heating component materials which limits the achievable UHV condition, and oxidize its heating components which consequently deteriorate the heating material and process quality. There are some techniques to overcome this problem, such as Platinum heating element, SiC heating element with well-designed shape, etc. However, each methods has their own issues, such as high maintenance frequency, short life time due to oxidation of heating components, etc.
AdNaNoTek's Laser heating manipulator is developed as a perfect solution for heating your sample for UHV thin-layer deposition in oxygen-rich and any atmospheric conditions. It does not possess the disadvantages that other heaters have. In addition, it is easy-to-use, compact, customizable, and has fast and localized heating mechanism. It is equipped with a pyrometer to monitor the temperature, and has a system control software to automatically control the laser heating parameters and processes. AdNaNoTek's Laser Heating Manipulator is very suitable for laser oxide/nitride epitaxial techniques.
Localized Heating Area
AdNaNoTek’s Laser Heating Manipulaotr can heat the substrate with well focus beam, such that, only the targeted area will be heated. The heating mechanism is confined in a very small area of the plate, while the surrounding area stay at a relatively low temperature, hence, reducing the outgassing from nearby surfaces. Can heat substrates effectively up to 1-inch diameter.
In addition, the system's support tube remains cool even after 10 hours of operation. No overheating of laser system upon using for long period of time.
Laser Controller combines number of leading technologies such as...
- Heating temperature 1200°C (E-3 torr and below) or 1000°C (above E-3 torr) Fully compatible to oxygen-rich or any atmospheric condition
- No heating components adds in vapor pressure in the chamber
- Localized heated area, lesser out-gassing during heating (you can deposit with a cleaner condition)
- Can process with rapid temperature ramping
- Easier maintenance compare to traditional substrate heater (the heating element is outside of the vacuum)
- Direct temperature measurement from sample/substrate by pyrometer