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What is MBE technology?
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UHV Molecular Beam Epitaxy (MBE)

Introductory Principle

Molecular Beam Epitaxy (MBE) is an ultrahigh vacuum (UHV) deposition technique used for producing high quality epitaxial (atomic layer) thin film with precise control on thickness, composition and morphology. This allows MBE technique to produce much higher thin layer quality compared to non-UHV-based techniques.

In MBE, the target material in the effusion cell is carefully heated to increase its vapor pressure. At UHV conditions (E-9 torr) the vapor can travel towards the substrate without collision, where it can condense on the substrate to form epitaxial thin layer film with high level of purity.

Despite the conceptual simplicity, a great technological effort is required to produce a system that yield desired thin-layer film qualities. The chamber design, careful control of vacuum environment, the quality of the source materials, the evaporation process, sample handling mechanisms, and over-all architecture needs to be designed with great precision in order to achieve high level of purity, uniformity, interface control in the deposited thin-layer film.

AdNaNoTek's MBE System is designed satisfying all those requirements. In addition, AdNaNoTek's FBBear system control software allows user to fully automate the deposition process and precisely control each parameters to achieve high quality thin-films.

Our long-term cooperation with our customers greatly expanded our MBE technology by developing different molecular sources and adapting to different coating deposition requirements.

图片
Molecular Beam Epitaxy in action
图片
Process Chamber of MBE
Picture
In MBE conference, It is so honor to take photo with Dr. Alfred Y. Cho the father of MBE technology. We have shortly discuss some epi news.


Systems Overview

MBE - 10
图片

Scientific Papers Generated from AdNaNoTek's MBE System

Papers: Applied Physics Letter (2015) 107, 012106
UHV Deposition Techniques
Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems
Integrated UHV Systems
Customized UHV Systems

UHV Technologies
Thin-film Deposition
Surface Science
Laser Heating Systems

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  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated >
        • Scientific Papers PLD
        • Scientific Papers MSD
        • Scientific Papers MBE
      • Certifications ISO 9001
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy (MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD >
      • PLD-12
    • SPUTTER
    • E-Beam evaporator
    • IBSD
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • Manipulators
    • Transfer Arms
  • Media
  • Contact