Sputter system | e beam evaporator | PLD | Pulsed laser deposition
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MPS - 5000: MBE - PLD - SPUTTER

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AdNaNoTek's MPS - 5000 is an linear integration system that includes MBE, PLD and MSD deposition tools.
Researchers can operate the systems individually or combine series of deposition process through the UHV Linear Transfer System (LTS).
All systems are UHV compatible (1E-10torr), and the transfer system can be extended indefinitely


Integrated Components

Molecular Beam Epitaxy (MBE -10)

MAIN SPECIFICATIONS:
  • UHV-compatible chamber
  • Base pressure: 1E-10 torr
  • Fully cryo panel covered
  • 4-axis (XYZ) manipulator with laser heater
  • Heating temperature up to 1100°C with ± 1°C
  • 10 effusion cells
  • RHEED system
  • Beam flux monitor
  • All metal leak valve
  • 1700l/s cryopump, turbopump, and roughing pump
  • Pressure control
  • Full range vacuum gauge
  • Industrial computer with 23" touchscreen monitor
  • System control software 
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Pulsed-Laser Deposition (PLD - 12)

MAIN SPECIFICATIONS:
  • 12" spherical chamber
  • Base pressure 5E-10torr
  • 4-axis (XYZR) manipulator with laser heater
  • Heating temperature above 1100°C ± 1°C
  • Planetary target manipulator with 6 1-in target holders
  • Mask with control software
  • Pressure control system
  • All metal leak valve
  • 1200l/s Pfeiffer turbo pump with roughing pump
  • Full range vacuum gauge
  • High pressure RHEED system
  • Industrial computer with 23" touchscreen monitor
  • System software Control
  • Laser optical path
  • Excimer laser (sold separately)
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UHV-Magnetron Sputtering (MSD - 24)

MAIN SPECIFICATIONS:
  • Base pressure 5E-10 torr
  • 4-axis (XYZR) manipulator with SiC/Mo heater
  • Heating temperature up to 900°C
  • Ion beam assisted source (optional)
  • 6 magnetron sputtering source
  • Dual mask system with control software
  • Thickness monitor
  • Pressure control system
  • 1200l/s Pfeiffer turbo pump with roughing pump
  • Full range vacuum gauge
  • Industrial computer with 23" touchscreen monitor
  • System software Control
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Optional

  • Pre-heating (degassing) system
  • Automatic transferring system
  • ARPES analyzer system
  • SEM
  • STM
  • IBSD

Integrated UHV Systems
Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems
Integrated UHV Systems
Customized UHV Systems

UHV Technologies
Thin-film Deposition
Surface Science
Laser Heating Systems

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© Copyright 2014 AdNaNoTek Corporation. All rights reserved.
  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Deposition systems_N
    • EBV_N
    • MBE_N
    • Magnetron Sputtering_N
    • PLD_N
    • Ion Beam Sputter Deposition_N
  • Direct Laser Writer_N
  • Media
  • Contact