Sputter system | e beam evaporator | PLD | Pulsed laser deposition
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​What is ALD and PE-ALD technology?
​

UHV Plasma Enhanced Atomic Layer Deposition (PEALD)

Introductory Principle

Plasma Enhanced Atomic Layer Deposition (PEALD) is a deposition technique used for producing high quality epitaxial (atomic layer) thin film. PEALD use chemical precursors in which each precursors are carefully selected and introduced in specific order. During the deposition process, the first deposited layer passivates the surface to inhibit further deposition. After that, the passivation will be removed and activate the surface to allow deposition of the second layer. This careful precursor introduction allow precise control of epitaxial deposition, thickness, composition and morphology.

AdNaNoTek's PEALD System can be modified to any type:
  • Rapid Thermal Atomic Layer Deposition
  • Low Pressure Atomic Layer Deposition
  • Plasma Enhanced Atomic Layer Deposition (Inductively Coupled Plasma, ICP or  Electron Cyclotron Resonance, ECR)

This technique permits the growth of high quality thin films with atomic layer precision.
Picture
Plasma Enhanced Atomic Layer Deposition in action
Picture
Precursor, valves, and gas lines

Systems Overview

PEALD - 6





Picture
UHV Deposition Techniques
Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems
Integrated UHV Systems
Customized UHV Systems

UHV Technologies
Thin-film Deposition
Surface Science
Laser Heating Systems

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  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated >
        • Scientific Papers PLD
        • Scientific Papers MSD
        • Scientific Papers MBE
      • Certifications ISO 9001
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Media
  • Contact