Pulsed Laser Deposition System

Pulsed Laser Deposition -Laser MBE (PLD-12L)

Pulsed Laser Deposition -​Laser MBE (PLD-18L)

New Product!!!

Pulsed Laser Deposition - (PLD- Speed)

Single Chamber PLD, compact and easy to use PLD for Scienist. Very suitable to be your second or third PLD and used in "dirty" or "unknown" trial application.
The Moduleize, this system is possible become
1. Sputter with 2 X 2 inch sputter cathode
2. PLD include laser heater manipulator and 6 target manipulator 
​3. Thermo evaporator with 3 boats
MAIN SPECIFICATIONS
  • 12-in Cylinder SS316L electro-polished Chamber
  • < 5E-7 Torr Base Pressure
  • Hipace 300 Turbor Pump  and Vacuum Gauges
  • 10x10mm substrate size
  • Fixed position sample manipulator
  • Laser Heating Element with sample heating temperature: 1000°C (in < E-3 torr) compatible to oxygen-rich and any conditions
  • Planetary target manipulator with 6 * 1"(or 3*2") target holders,
  • Target Z stage movement 
  • Laser viewport with "smart defender"
  • FBBear System Control Software

Pulsed Laser Deposition -
Laser MBE (PLD-12L)

MAIN SPECIFICATIONS
  • 12-in Spherical SS316L electro-polished Chamber
  • < 5E-10 Torr Base Pressure
  • Hipace700 Turbor Pump  and Vacuum Gauges
  • 10x10mm substrate size
  • 5-axes sample manipulator (XYZ, Rotation, and Tilt)
  • Laser Heating Element with sample heating temperature: 1200°C (in < E-3 torr) and 1000°C (in > E-3 torr) compatible to oxygen-rich and any atmospheric conditions
  • Planetary target manipulator with 6 * 1"(or 3*2") target holders,
  • Target Z stage movement 
  • Laser viewport with "smart defender"
  • Sample and target in-vacuum transfer
  • FBBear System Control Software
Optional:
  • High pressure RHEED system (real-time epitaxy monitoring) 
  • Excimer laser with optical path
  • Mask system with z-motion
  • Pressure control system: upstream and downstream​
  • Wedge function and multi mask allow you one deposition get different thin films

Pulsed Laser Deposition -
​Laser MBE (PLD-18L)

MAIN SPECIFICATIONS
  • 18-in Spherical SS316L electro-polished Chamber
  • < 5E-10 Torr Base Pressure
  • UHV pumps and gauges
  • 10x10mm substrate size(up to 2 inch)
  • 5-axes sample manipulator (XYZ, Rotation, and Tilt)
  • Laser Heating Element with sample heating temperature: 1200°C (in < E-3 torr) and 1000°C (in > E-3 torr) compatible to oxygen-rich and any atmospheric conditions
  • Planetary target manipulator with 8 * 1"(or 4*2") target holders
  • Laser viewport with "smart defender"
  • Sample and target in-vacuum transfer
  • FBBear System Control Software
Optional:
  • High pressure RHEED system (real-time epitaxy monitoring) 
  • Excimer laser with optical path
  • Mask system with z-motion
  • Pressure control system: upstream and downstream​

 ​

Adnano-tek is manufacturer of Pulsed Laser Deposition Systems for R&D,  full production capabilities for a variety of applications. We sold PLD systems to national laboratories,  and universities. Our customer base has many repeat customers buying more over several years.

Pulse Laser Scanning in X and Y High Speed scan
Large Target laser rastering scan
Wish deposit large size wafer with nice uniformity. Here is answer!
With High speed scanning system; Adnano-tek PLD-18L become industrial PLD, It can deposit large size wafer up to 8 inch.
With this benefit, customer safe valiable target, and Excellent uniformity

Pulsed Laser Deposition System
PLD/Laser MBE

Pulsed Laser Deposition (Laser MBE or PLD) can deposit thin-film with extremely high quality and great repeatability. This special system is equipped with a planetary target holder with maximum of 6(9) targets. This allows the target manipulator to revolve and rotate. The revolution allows selection of different sample targets, and the rotation (together with the sweep mechanism) allows improvement in the efficiency of the target material for thin film deposition. The mask system allows formation of unique deposition pattern on the thin film. The target position can also be adjusted up and down to optimize target to substrate distance. It is designed to allow, in-vacuum target exchange. PLD can adapt different design depending on researcher's need: It can be designed with multi-functional coating tool extension compatibility, which allows the system to be installed with a variety of deposition components, such as effusion cells, magnetron sputtering source, e-beam evaporators, etc; or it can designed to have minimal footprint and compact structure for flexible mobility, which allows researchers to easily arrange the position and/or transfer the equipment with ease.
PLD is also installed with laser heating manipulator which is the perfect heater especially for oxygen-rich or any atmospheric conditions. It provides a highly localize heating mechanism that can easily heat up the substrate up to 1200°C (at E-3 torr and below), hence maintaining the nearby components at a low temperature to avoid substrate contamination due to out-gassing. In addition, precise control and high stability is achieved by making the process automated with the use of the FBBEAR control software. The FBBEAR control software, provides complete data logging, precise parameter tuning  which allows user to have easy operation and reliable experimental repeatability.

PLD (Laser MBE) can be applied for thin layer deposition of materials like: Heterostructure metal oxides (e.g. Fe/SrTiO3, Nb/SrTiO3, BiFeO3, etc), high temperature superconducting materials, silicon oxides, high k oxides, metal nitrides, ferroelectric materials, etc.

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This Linear transfer system include one PLD system and UHV sputter, sample could transfer from one to other chamber through magnet arm. Totally UHV condition and easy access subtracts. Sputter equip up to 6 cathodes and laser heater heating up to 1000 degree C.
PLD easy upgrade to Laser MBE by any high pressure RHEED from RHEED supplier.

Advantages of Pulsed Laser Deposition

  • Can work in reactive gas environment (e.g. oxygen- or nitrogen-rich environment)
  • Versatile method (any material)
  • Congruent evaporation
  • High deposition rates
  • Clean process
  • Plume at high energy
  • Broad range of gas pressures Φ

Laser Heating Manipulator

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AdNaNoTek's Laser heating system is developed as a perfect solution for heating your sample in oxygen- and nitrogen-rich atmosphere and is UHV compatible.

AdNaNoTek’s Laser Heater can heat the substrate with well focus beam, such that, only the targeted area will be heated. The mechanism with a small distance from the plate stay at a relatively low temperature, reducing the outgassing from nearby surfaces.

In addition, the system's support tube remains cool even after 10 hours of operation.

Target Replacement under Vacuum

In a traditional PLD system, every time the target material ran out, the system must be vented to air for target replacement, however by doing so, the process parameters and the cleanliness of the system environment will be affected.

AdNaNoTek’s PLD system provides a way to replace the target in UHV condition, so we can maintain the system's cleanliness and process parameters.
Adnano-tek RHEED Screen Set
This RHEED screen is shield protected; it can block primary electron beam and avoid this strong e-beam damage phosphorus screen
Due to the high pressure of condition; sometimes the electron beam is diffused and looks fuzzy.
Our screen design is capible extended closed to sample or far away from substrate.

More Optional

  • O2/N2 plasma source
  • Optical component for excimer laser
  • Lead glass covered for each viewports
  • Mechanical particle filter
  • Ion beam assist
  • Thickness monitor
  • Residue gas analyzer
  • Pre-annealing heating system in load lock
  • Preparation/Buffer chamber

Related Links:

Technologies: PLD
Products: PLD - 12
Brochures: PLD
Results: Large-scale PLD Result
Papers: PLD

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