Sputter system | e beam evaporator | PLD | Pulsed laser deposition

Pulsed Laser Deposition


Adnanotek's PLD systems provide deposition of a wide range of materials with monolayer accuracy. Entire deposition process is controlled by industrial computer and fully automatic. Important process parameters set by operator could be visible and controlled in real time. Applications of our PLD systems are mostly focused on quantum devices fabrication.
Picture
  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Deposition systems_N
    • EBV_N
    • MBE_N
    • Magnetron Sputtering_N
    • PLD_N
    • Ion Beam Sputter Deposition_N
  • Direct Laser Writer_N
  • Media
  • Contact

​PLD-12-Super

Picture
  • Single chamber
  • Sputter with 2×2 in sputter cathodes
  • 12 in cylinder SS 316L electro-polished chamber
  • < 5E(-7) torr base pressure
  • Excimer laser source with 6×1 in (or 3×2 in) planetary  targets
  • Thermal evaporator with 3 boats
  • Laser viewport with “smart defender”
  • Substrate 10×10 mm2 with fixed position
  • With laser heating element Ts could reach up to 1000 C in Oxygen rich ambiance
  • FBBEAR entire system control software

PLD-12L

Picture
  • 5-axes sample manipulator: XYZ, rotation and tilt
  • 12 in spherical SS 316L electro-polished chamber
  • < 5E(-10) torr base pressure
  • Excimer laser source with 6×1 inch (or 3×2 inch) planetary  targets
  • Thermal evaporator with 3 boats
  • Laser viewport with “smart defender”
  • Substrate 10×10 mm2 with fixed position
  • With laser heating element Ts could reach up to 1000 C in Oxygen rich ambiance
  • Modular design
  • FBBEAR entire system control software

PLD-18L

Picture
  • SS 316L 18 inch spherical electro polished chamber
  • Base pressure 5E(-10) torr
  • Wafer size 10×10 mm2, up to 2 in
  • 5-axes substrate manipulator (XYZ, rotation and tilt)
  • Laser substrate heater up to 1200 C
  • Laser viewport with “smart defender”
  • Compatible with oxygen rich ambience
  • Planetary target manipulator with 8×1in (or 4×2 in) targets
  • FBBEAR entire system control software
  • Modular design
  • RHEED set up
  • Mask system with z-motion (opt)
  • Pressure control system: upstream or downstream (opt)

123
​Paragraph. 按此處以編輯.

    Title Text. 按此處以編輯.

Subscribe to Newsletter
Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems
Integrated UHV Systems
Customized UHV Systems

UHV Technologies
Thin-film Deposition
Surface Science
Laser Heating Systems

Legal Notice   |   Privacy Policy   |   Site Map
ENGLISH
中文
© Copyright 2014 AdNaNoTek Corporation. All rights reserved.
  • AdNaNotek
    • News
    • Online Catalogs
    • Articles >
      • Scientific Papers Generated
      • Events
    • UHV Technology >
      • E-Beam Research
      • CIGS Research
      • UHV Deposition Techniques >
        • Molecular Beam Epitaxy ( Laser MBE)
        • Pulsed Laser Deposition (PLD)
        • Magnetron Sputtering Deposition (MSD)
        • Electron Beam Evaporator (EBE)
        • Ion-Beam Sputter Deposition (IBSD)
        • Plasma Enhanced Atomic Layer Deposition (PEALD)
      • FBBear System Control Software
      • Useful Data
    • Profile
  • PVD
    • Industrial >
      • Large Sputter
      • Industrial E-Beam
    • MBE
    • PLD
    • SPUTTER
    • E-Beam evaporator
    • IBSD and IBE
    • Josephson Junction E-Beam(Qubit manufacture)
    • Customized UHV Systems
  • Laser Heater
  • UHV Cluster System
  • ALD and CVD
    • Etching >
      • RIE 80
      • Plasma-80ICP
      • Remote Plasma source
    • ALD (Atomic Layer Deposition)
  • UHV design & components
    • Substrate Manipulator
    • Chambers
    • Custom Weldments
    • Isolation Vacuum Gate Valves
    • Shielding Gate Valves
    • XYZ stage
    • Transfer Arms
  • Deposition systems_N
    • EBV_N
    • MBE_N
    • Magnetron Sputtering_N
    • PLD_N
    • Ion Beam Sputter Deposition_N
  • Direct Laser Writer_N
  • Media
  • Contact