PS - 3000: PLD - SPUTTER

AdNaNoTek 's PS - 3000 is an linear integration system including PLD and Magnetron Sputtering coating tools.

Researchers can operate the systems individually or combine multi/different coating process through the UHV linear transferring system.

All systems are UHV compatible (5E-9torr) in PS - 3000, and the tunnel system can be extended unlimitedly. 

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Integrated Components

Pulsed-Laser Deposition System (PLD-12)

MAIN SPECIFICATIONS:

• 12" spherical chamber
• Base pressure 5E-10torr
• 4-axis manipulator with laser heater
• Heating temperature above 1200°C, ± 1°C
• 6 1" target holder with revolution and rotation(target size depends on request)
• Mask with control software
• Pressure control system
• All metal leak valve
• 685l/s Pfeiffer turbo pump
• Full range vacuum gauge
  
• Computer software Control
• Industrial computer 
• System control software 

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UHV-Magnetron Sputtering System (MSD-24)

MAIN SPECIFICATIONS:

• Base pressure 5E-9torr (5E-10 up on request)
• 4-axis manipulator
• Heating temperature up to 900°C
• Ion beam assisted deposition system (optional)
• 6 magnetron sputtering sources available
• Dual mask system with control software
• Thickness monitor
• Pressure control system
• 700l/s Pfeiffer turbo pump
• Full range vacuum gauge
  

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Optional

• Pre-heating (degassing) system
• Automatic transferring system
• ARPES analyzer system
• SEM
• STM
• IBSD
  

Integrated UHV Systems