SE - 4500: MSD - E-BE/MBE

AdNaNoTek 's SE - 4500 is an linear integration system including Magnetron Sputtering and E-Beam Evaporator (with effusion cell module) coating tools.

Researchers can operate the systems individually or combine multi/different coating process through the UHV linear transferring system.

All systems are UHV compatible (5E-9torr) in SE - 4500, and the tunnel system can be extended unlimitedly. 

Integrated Components

UHV-Magnetron Sputtering System (MSD-24)

MAIN SPECIFICATIONS:
  • 24-in Cylindrical dome shape chamber
  • Substrate size: 2-in
  • Base pressure 5E-10torr
  • 4-axis manipulator
  • SiC heating element
  • Heating temperature up to 800°C
  • 6 magnetron sputtering source (max 6 available)
  • 1 RF and 3 DC Power Supply
  • Water cooling
  • Thickness monitor
  • 1200l/s Pfeiffer turbo pump
  • Differential pumping mechanism
  • MFC and Pressure control system
  • Full range vacuum gauge
  • Industrial computer with 23" touchscreen
  • FBBear system control software

Electron Beam Evaporator with Effusion Cell Module (E-Beam-1M)

MAIN SPECIFICATIONS:
  • 16.5" Cylindrical chamber
  • Base pressure 5E-10torr
  • Substrate size: 2-in
  • 4-axis manipulator (1)
  • SiC Heating Element
  • Heating temperature above 800°C
  • 360° tiltable manipulator (2)
  • <100K liquid nitrogen cooling
  • E-gun source
  • 6kW Power source
  • 2 effusion cells
  • Water cooling
  • Single mask with control software
  • 2300l/s Pfeiffer turbo pump
  • MFC and Pressure control system
  • All metal leak valve
  • Full range vacuum gauge
  • Industrial computer with 23" touchscreen
  • FBBear system control software

Optional

  • Pre-heating (degassing) system
  • Automatic transferring system
  • ARPES analyzer system
  • SEM
  • STM
  • IBSD