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![]() MAIN SPECIFICATIONS:
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Magnetron Sputtering System
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tin_2020_4_.pdf | |
File Size: | 1227 kb |
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Suptter 24 is Our most famous UHV sputter.
Precise control, easy use software, up to 7 cathode available in each chamber. Used in ultra thin film application, magnetic application and quantium field.
MAIN SPECIFICATIONS:
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Twin Sputter 24 System
Two Sputter 24 link together So there are two set of 6 confocal sputter cathodes facing to manipulator, Use laser heater for oxide thin film application. Applications: - MTJ, TMR sputtering -Spin Electronics -Superconducting Niobium titanium nitride (NbTiN) - Pt/Co/Ta, Pt/Co/Pt, etc... |
SPUTTER MAIN SPECIFICATIONS:
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PLD MAIN SPECIFICATIONS:
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More Optional
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Related Links:
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UHV Sputter v.s. High vacuum Sputter |
Left result are Comparation result shows in SIMS analysis, that O2, C, Cl, N contamination compare to High vacuum sputter systems.
Left side is Adnano-tek Sputter SIMS result, Right side is Other high vacuum Sputter You can see Adnano-tek Pd film and Pt film H+ and O-, N- ions peaks are much lower than Right side other Sputter system. So, Result tell us Our Sputter can give customer better result and more clean thin film. |
Ultrahigh Vacuum (UHV) Systems
UHV Deposition Systems Integrated UHV Systems Customized UHV Systems |
UHV Technologies
Thin-film Deposition Surface Science Laser Heating Systems |